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Chapter 1. Introduction. Chapter 2. Crystal Growth. Chapter 3. Silicon Oxidation. Chapter 4. Photolithography. Chapter 5. Etching. Chapter 6. Diffusion. Chapter 7. Ion Implantation. Chapter 8. Film Deposition. Chapter 9. Process Integration. Chapter 10. IC Manufacturing. Chapter 11. Future Trends and Challenges. Appendix A: List of Symbols. Appendix B: International System of Units (SI Units). Appendix C: Unit Prefixes. Appendix D: Greek Alphabet. Appendix E: Physical Constants. Appendix F: Properties of Si and GaAs at 300 K. Appendix G: Some Properties of the Error Function. Appendix H: Basic Kinetic Theory of Gases. Appendix I: SUPREM Commands. Appendix J: Running PROLITH. Appendix K. Percentage Points of the t Distribution. Appendix L: Percentage Points of the F Distribution. Index.